Film formation - Company Ranking(18 companies in total)
Last Updated： Aggregation Period:Apr 08, 2026〜May 05, 2026
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Display Company Information
| Company Name | Featured Products | ||
|---|---|---|---|
| Product Image, Product Name, Price Range | overview | Application/Performance example | |
| ■Supported film types: DLC, SiO2, SiN, SiC ■Maximum possible size: φ12 inches × t20mm ■Compatible substrates ・Si Wafer ・Glass ・... | For more details, please feel free to contact us. | ||
Ion plating deposition
Other |
■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/... | For more details, please feel free to contact us. | |
Sputtering deposition
Other |
■Supported film types: Ti, TiN, TiC ■Maximum allowable size: φ12 inches × t50mm ■Compatible substrates ・Si Wafer ・Glass ・Fil... | For more details, please feel free to contact us. | |
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東邦化研
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- Featured Products
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Plasma CVD film deposition
- overview
- ■Supported film types: DLC, SiO2, SiN, SiC ■Maximum possible size: φ12 inches × t20mm ■Compatible substrates ・Si Wafer ・Glass ・...
- Application/Performance example
- For more details, please feel free to contact us.
Ion plating deposition
- overview
- ■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/...
- Application/Performance example
- For more details, please feel free to contact us.
Sputtering deposition
- overview
- ■Supported film types: Ti, TiN, TiC ■Maximum allowable size: φ12 inches × t50mm ■Compatible substrates ・Si Wafer ・Glass ・Fil...
- Application/Performance example
- For more details, please feel free to contact us.
-
東邦化研
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