Film formation - Company Ranking(18 companies in total)

Last Updated：Jan 28, 2026 Aggregation Period:Dec 31, 2025〜Jan 27, 2026
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Company Name	Company information	Featured Products
Company Name	Company information	Product Image, Product Name, Price Range	overview	Application/Performance example
東邦化研	Address Saitama/ number of employees 100 Business Activities Contract processing of thin films using ion plating, vacuum deposition, sputtering, and plasma CVD (Contract manufacturing of functional t... Key Partners	Plasma CVD film deposition Other	■Supported film types: DLC, SiO2, SiN, SiC ■Maximum possible size: φ12 inches × t20mm ■Compatible substrates 　・Si Wafer 　・Glass 　・...	For more details, please feel free to contact us.
		Thick film formation Other	■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/...	[Target Objects] A wide range including glass, ceramics, resin materials, metals, Si wafers, etc., and capable of handling three-dimensional...
		Ion plating deposition Other	■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/...	For more details, please feel free to contact us.
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